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Demo units available for loan! You can process several sheets at once.
This machine is a spin-type spray developing device that performs developing, rinsing, washing, and drying through automatic and manual operation. It can process several workpieces at once. For more details, please contact us or refer to the catalog.
Device dimensions: 560W × 850D × 1300H
Set the substrate in the chuck manually, then perform spray development, rinsing, and spin drying.
Automatic and manual operation will perform developing, rinsing, washing, and spin drying!
The SD-8004 model is a spin spray development system for 4" to 8" wafers. It performs developing, rinsing, water washing, and spin drying through automatic and manual operation. Condition settings are done via a touch panel on the operation panel. Each processing mode is displayed on the touch panel during the respective mode. For more details, please contact us or refer to the catalog.
